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Chemically modified mask design could potentially slow the spread of viruses

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Chemically modified mask design could potentially slow the spread of viruses

Postdoctoral fellow Hun Park (left) and graduate student Haiyue Huang Self-sanitizing face mask project receives NSF rapid response research grant
More at https://www.nsf.gov/discoveries/disc_summ.jsp?cntn_id=300476&WT.mc_id=USNSF_1


This is a Research News item.

Read more at nsf.gov

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